
Semiconductor: Amorphous Silicon (a-Si) and Poly Crystalline Silicon Thickness Measurement
Measure the optical constants (n and k) of both amorphous and polysilicon with the Filmetrics F20. The tool includes sophisticated measurement routines that simultaneously measure and report the substrate thickness, the silicon layer thickness as well as the interlayer SiO2 thickness, all with a single mouse-click. We also offer free trial Si wafer thickness measurements – with results typically available in 1-2 days.

Semiconductor: Dielectric Properties Measurement
Accurate measurement of dielectric films is critical for the electronics industry. Here are the most common dielectric measurements characterized by a Filmetrics measurement system:
Silicon dioxide thickness: SiO2 film thickness can be measured by our Filmetrics systems, from 3nm up to 1mm thick.
Refractive index of silicon nitride (Si3N4): Measuring silicon nitride refractive index alongside the thickness of the film allows complete characterization of your Si3N4 film in seconds. Contact our thin-film experts to discuss your dielectric application or ask for a free trial.
Display: ITO Film Thickness
Measure film thickness of indium tin oxide (ITO) and other transparent conductive oxides (TCOs) using accurate measurements of refractive index. Filmetrics tools can measure liquid crystal layers, including polyimide, hardcoat, liquid crystal and OLED layers, including the emission, injection, buffer, and encapsulation layers.

Biomedical Coatings Thickness Measurement
Measure thickness of coatings for biomedical applications such as catheter and angioplasty balloons, stents, guide wires, needles and other implants with one click using our Filmetrics tools. Often these devices have biomedical coatings to protect the device from corrosion while others protect from complications such as tissue trauma, infection, or even rejection. Measuring thickness of drug delivery coatings is also a common application. Our Filmetrics tools can deliver fast and reliable thickness measurements that are non-destructive and require no sample preparation.

Display: OLED Metrology
Organic Light-Emitting Diodes (OLEDs) are used in many display devices, including cell phones and TVs. The metrology of the many thin films that make up OLED displays is of critical importance and requires a non-contact measurement system to effectively measure OLED thickness. Our F20-UV, F40-UV film thickness measurement instruments and F10-RT-UV reflectometer instruments offer inexpensive, robust, and non-invasive metrology of simple prototype devices and fully pixelated displays. Because our OLED measurement instruments are spectroscopic, one can also detect chemical changes that can occur in these atmospherically sensitive materials. We also offer free trials of thickness measurements of OLED film samples.

Semiconductor: Photoresist Thickness Measurement
Several single-spot tabletop and mapping tools such as the Filmetrics F20, Filmetrics F3-sX and Filmetrics F50/F60-t measure photoresist thickness and etch rate of single-layer, multiple-layer and even freestanding photoresist films. All Filmetrics models measure resist thickness (and index) by accurately modeling spectral reflectance. Special proprietary algorithms allow robust “one-click” analysis, with results typically available in less than a second. Measurement of SU-8 thickness, Dow BCB thickness and other thick photoresists are popular applications for the Filmetrics product line.

Porous Silicon Thin Film Measurement
Porous silicon has significant usage in a wide range of applications, including optical devices, gas sensors, and biomedical devices.
Porous thin-film measurements of interest include layer thickness and porosity. In general, non-destructive methods like gravimetric measurements are used to measure porosity, but the accuracy of this method is very low. Filmetrics® tools such as the F20, F40 and F50 instruments deliver a unique analysis algorithm that reveals layer thickness, index, and porosity of porous silicon with a single mouse-click.

Semiconductor Process Films Measurement
Filmetrics® tools offer a full range of instruments and systems for measuring thickness and index of any non-metallic semiconductor process film.
The universally popular Filmetrics F20 general purpose thin film thickness measurement instrument is the most affordable solution for single-spot measurements of thickness and index.
The Filmetrics F40 microscope-based film thickness measurement instrument is for small-spot-size thickness measurements (down to 1 micron or less) and will attach to your microscope.
The Filmetrics F50 film thickness mapper will accurately measure film thickness and automatically map point-by-point of blanket films.
Alternatively, product wafers requiring small spot size and pattern recognition will find the Filmetrics F54-XY an exceptional choice.
Our patented thickness imaging technology results in easier set up, fewer recipes, more robust pattern recognition, and much lower cost than conventional thin-film metrology tools. Both stand alone and integrated versions are available.

Silicon Wafer and Membrane Thickness Measurement
Filmetrics® systems include tabletop, mapping, and production systems for silicon wafer thickness measurement and membrane thickness measurement. Wafer materials commonly measured include single polished or double polished Si (Silicon), Sapphire, Fused Silica, SiC, LiTaO3, GaN, and Glass.
Our technical experts can help you find the best Filmetrics tool that fits your thickness measurement requirements that may include a need for various thickness ranges or a single-spot measurement vs. thickness mapping requirement, etc.

Solar Photovoltaic Measurements
Filmetrics® F20 thin film analyzers are used by dozens of Thin-Film Photovoltaics (TFPVs) manufacturers to measure the thickness and optical constants of all three types of photovoltaic active layers. To measure photovoltaic active layers on top of TCO, Filmetrics experts have extensive experience characterizing both in-house and glass-supplier single or multi-layer TCO stacks.
We also offer tabletop, mapping or in-line solutions for the measurement of films that include polyimides, anti-reflection coatings and photoresists.

Coil thickness measurement and polymer film thickness measurement
In the manufacturing of plastics and polymers, the thickness of plastic films and polymer films is crucial to quality. This includes the measurement of total film thickness (up to 1 mm), co-extruded sub-layer thickness, and coil thickness. For PET coatings, our F20-UV can be used to complete film thickness measurement. It can measure extremely thin layers (~10 nm) and even measure high-energy plasma surface treatments. Our standard F20 can measure ubiquitous coatings, such as hard coatings with a thickness range of 0.05 to 50 μm.
We have an extensive refractive index database suitable for a range of polymer films, including PET, polycarbonate, cellulose, and polyolefins, as well as more exotic materials such as conductive polymers.
Each of these applications presents a unique set of challenges, and we possess the software, hardware, and application expertise to deliver the right measurement solutions for coil thickness and polymer film thickness.