Filmetrics® F3-sX Film Thickness Measurement Series

Film Thickness Measurement Instruments

The F3-sX family measures semiconductor and dielectric layers up to 3mm thick. Such thick layers tend to be rougher and less uniform than thinner layers, which the F3-sX counters with a 10µm diameter measurement spot. Measurement rates of up to 1 kHz also make the F3-sX a top choice for many in-line applications (e.g. roll-to-roll processes).

Product Features

Measures materials with unique stand-alone requirements that are difficult to measure with other instruments
System package includes an integrated spectrometer/light source unit, FILMeasure software, single-spot measurement stage with 10µm spot size, Si reflectance standard and FILMeasure standalone software for remote data analysis
Results available in fractions of a second
Built-in online diagnostics
Intuitive analysis software included
Sophisticated history function for saving, reproducing and plotting results
24-hour (M-F) phone, email and online support by application engineers

 

 

Applications

Si wafer thickness
Conformal coatings
IC failure analysis
Thick photoresist (e.g., SU-8)

 

 

 

Industries

Semiconductor
Compound semiconductor
Coatings

 

 

 

 

 

 

 

 

 

选择合适的 Filmetrics F3-sX 仪器进行薄膜厚度测量

F3-sX 系列使用近红外 (NIR) 光来测量层厚,甚至测量许多肉眼不透明的层(例如半导体)。980nm 波长版本 F3-s980 专为成本敏感型应用而设计。F3-s1310 针对测量重掺杂硅进行了优化,而 F3-s1550 则针对最厚的层进行了优化。

 

 

 

 

Integrated Circuit (IC) Failure Analysis

Failure Analysis (FA) techniques are used to locate and identify the cause of failure in integrated circuits (IC).

Backside thinning: Backside IC FA requires removing most of the Si die thickness before the circuitry can be imaged and knowing the thickness of the remaining Si after each thinning step. The Filmetrics F3-s1550 system was designed specifically for chip manufacturers to take on the challenge of measuring the thickness of rough Si layers resulting from various backside thinning processes.

 

 

 

 

Photoresist Thickness Measurement

Several single-spot tabletop and mapping tools such as the Filmetrics F20, Filmetrics F3-sX and Filmetrics F50/F60-t measure photoresist thickness and etch rate of single-layer, multiple-layer and even freestanding photoresist films. All Filmetrics models measure resist thickness (and index) by accurately modeling spectral reflectance. Special proprietary algorithms allow robust “one-click” analysis, with results typically available in less than a second. Measurement of SU-8 thickness, Dow BCB thickness and other thick photoresists are popular applications for the Filmetrics product line.

 

 

 

 

 

Silicon Wafer and Membrane Thickness Measurement

Filmetrics® systems include tabletop, mapping, and production systems for silicon wafer thickness measurement and membrane thickness measurement. Wafer materials commonly measured include single polished or double polished Si (Silicon), Sapphire, Fused Silica, SiC, LiTaO3, GaN, and Glass.

Our technical experts can help you find the best Filmetrics tool that fits your thickness measurement requirements that may include a need for various thickness ranges or a single-spot measurement vs. thickness mapping requirement, etc.

 

 

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