In terms of simplicity, versatility,
ease of operation and overall cost of
ownership, the OAI Edge-bead and
Flood Exposure Systems are by far
the best solution available.
the OAI Model 2000 may be configured as
either an edge-bead exposure tool or a
flood exposure system; both configurations
are based on a proven, time-tested platform.
The Model 2000 includes a UV lightsource,
intensity controlling power supply, and robotic
substrate handling subsystem. UV lightsources
provide uniform intensity beams with divergence
half-angles of <2.0º. Power supplies are available
from 200W to 5,000W. Intensity controller
sensors are linked directly to the lightsource for
accurate intensity monitoring. The OAI robotic
substrate handling system is microprocessor
controlled and may be programmed to accommodate a wide variety of substrate
sizes. The shadow mask capability enables the user to pattern the top-side of a
substrate while being held in very close proximity to the mask. At a separation
of 25 microns, these systems are capable of 6 micron resolution.
2000FL Flood Exposure Systems are used to augment and/or enhance
the photolithography processes in both production and R&D settings.
Applications include photoresist stabilization and modification, image
reversal and PCM processes.
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Throughput is independent of
pattern complexity.
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Entire substrate is exposed at one time.
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Intensity-controlling power supply.
