Model 212 Mask Alignerand UV Exposure System
The Model 212 Large Area Mask Aligner is a costeffective, high performance Mask Aligner that has
been engineered with OAI’s industry proven components that have made OAI a leader in the
photolithography equipment industry. The
Model 212 is a bench top mask aligner that
requires minimal cleanroom space, and
offers an economic alternative for R&D
for large area substrates, LCD, Thin Film
Transistors, panel level packaging, and
OLED. Utilizing OAI’s innovative vacuum
chuck leveling system, large substrates (up
to 12’x12’ or 300mm x 300mm) are leveled quickly and gently for exceptional
photo mask alignment and uniform contact
during exposure. The system is capable
of one micron resolution and alignment.
The alignment module features mask insert
sets and quick-change wafer chucks that facilitate the use of a variety of substrates and
masks without requiring special tools. The
Model 212 Large Area Mask Aligner features the
proven OAI UV light source which provides collimated UV light in Near, Mid or Deep UV using
lamps ranging in power from 200 to 2000 watts.
Dual-sensor optical feedback loops are linked to the
constant intensity controller to provide control of
exposure intensity within ±2% of the desired intensity
Handles substrates up to 12’ x 12’ or 300mm x 300mm
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Features
Small Footprint
价格实惠
精密对准
紫外光具有高准直性和均匀性
可轻松适配多种大面积基板和掩模
